說道服裝設(shè)計留學，美國SCAD深得眾多藝術(shù)生的青睞。那么美國薩凡納藝術(shù)與設(shè)計學院服裝留學要求是什么呢?下面讓我們看一下詳情。

說道服裝設(shè)計留學，美國SCAD深得眾多藝術(shù)生的青睞。那么美國薩凡納藝術(shù)與設(shè)計學院服裝留學要求是什么呢?下面讓我們看一下詳情。

一、院校介紹

SCAD是全美最大的藝術(shù)學院，也是全球最大的專門藝術(shù)大學之一。位于佐治亞州有著200多年的歷史古城薩凡納市。由于整個城市的古建筑保存完好，這里被人們稱為美國最美麗的城市之一。學院建筑系的教學樓是一座建于1887年的古屋，而整個城市更像是一座活生生的建筑博物館，有著百年歷史的建筑隨處可見，現(xiàn)在仍舊有人居住和使用。

院校排名：薩凡納藝術(shù)與設(shè)計學院在2019QS世界大學專業(yè)排名(藝術(shù)&設(shè)計)中，名列世界第47，美國第16。

School of Design設(shè)計學院：

設(shè)計學院下面設(shè)有以下幾個系：可持續(xù)設(shè)計(Design for sustainability)MA，設(shè)計管理(Design management)MA、MFA，纖維(Fibers)，工業(yè)設(shè)計(Industrial design)BFA / MA、MFA，珠寶設(shè)計系(Jewelry and objects)BFA / MA、MFA，服務設(shè)計(Service design)BFA / MFA。這些專業(yè)都是在薩凡納校區(qū)上課。

二、服裝設(shè)計申請要求

申請專業(yè)

M.F.A. in fashion 90學時

作品集要求

Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.

托福/雅思要求：

SCAD's TOEFL institution code is 5631.

申請專業(yè)

M.A. in fashion 45學時

作品集要求

Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.

以上即是關(guān)于美國薩凡納藝術(shù)與設(shè)計學院服裝留學要求的介紹，希望對你有幫助。如果有更多關(guān)于藝術(shù)留學的問題，可咨詢acg藝術(shù)留學客服或者撥打我們的官方電話：400-612-8881。

工業(yè)設(shè)計作品集